ANALYTICS COMPETENCE CENTER

Cluster Tool Ultra High Vacuum Equipment

At the heart of the Analytics competence center in InnovationLabs laboratory facililities is ultra high vacuum equipment (the Cluster Tool) in which film systems with vapor deposited organic thin films can be studied without problematic vacuum interruptions and critical sample transfers. Plans have been made for the equipment to provide components for the preparation of samples via thermal evaporation and analytical methods for the characterization of these samples. The analytical methods include methods of photoelectron spectroscopy (XPS, UPS, IPES), scanning probe methods (AFM, SKP), scanning electron microscopy (REM) and infrared spectroscopy (IR). If necessary, the Cluster Tool can be extended to accommodate supplementary analytical or preparation methods at free ports.

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Research into Fundamental
Technical Questions in Physics

With the aid of powerful analysis in well defined samples, the planned experiments will help to answer fundamental technical questions in physics in regard to organic electronics. Through cooperation between various specialized working groups on-site, scientific findings will be exchanged directly, thus contributing to a more efficient process. As a result, a competence center for the analysis of organic functional thin films will be established with the Cluster Tool. The cluster system allows research to be conducted on the properties of organic semiconductors relevant to components. Methods for the analysis of the electronic structure, the morphology and the chemical bonding states and phonon structure will be combined soon for this purpose. The methods of analysis applied will be integrated into a UHV system.

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Greatest Comparability of Samples by
Way of Ultra High Vacuum

In the ultra high vacuum equipment, samples can be put into various analysis equipment via a transfer system to achieve a great degree of comparability between samples. In order to receive pure, reproducible results unaffected by contamination over the required measurement period, the system is evacuated to a base pressure of <10-10 mbar using turbo pumps or ion getter pumps.

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Wet Chemical Preparation of
Interfaces

For interfaces to be prepared for wet-chemical treatment, a glovebox is used to purge intrinsic films under dissolved inert gas. The influence of gas from the environment, such as O2 and H2O, on contamination and degradation can be prevented specifically or eliminated by way of appropriate exposition during or after processing. This makes it possible to set guidelines for the technical application of organic components that are developed under other experimental constraints.

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Deposition of Film Systems Relevant
to Components

In order to deposit film systems relevant to components, various deposition chambers with specific materials must be integrated. Three evaporation chambers (two for organic materials in combination with metal oxides and one for metals) are planned for this purpose. They will be connected to each other via an automated sorting system.

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